As advanced processes continuously push the limits of Moore's Law, the "gate length" is also known as the "process node."
From the early 90nm, 65nm, 45nm, 22nm, and 14nm processes, down to the latest 2nm and 1nm technologies:
1. FOUP/cassette that directly contacts the product
2. Cleanliness of the process chamber 3. Whether the filter effectively intercepts contaminants, etc.
All of these significantly impact process yield. Traditional micron-level technologies can no longer meet nano-scale application requirements.
How can we effectively and accurately obtain contamination information?
TSI is ready to respond.
This video will show you how TSI operates in the nano-scale world,
capturing the most critical nano-scale contaminants. Bonfiling provides you with the best contamination detection solution.